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Application of interference methods for determination of curvature radius in metal–oxide–semiconductor (MOS) structures

Object's details: Application of interference methods for determination of curvature radius in metal–oxide–semiconductor (MOS) structures

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Provider:Dolnośląska Biblioteka Cyfrowa

Description

Title:
Application of interference methods for determination of curvature radius in metal–oxide–semiconductor (MOS) structures
Creator:
Rzodkiewicz, Witold;
Borowicz, Lech
Contributor:
Gaj, Miron. Redakcja;
Wilk, Ireneusz. Redakcja
Opis:
Optica Applicata, Vol. 35, 2005, nr 3, s. 523-527
Dostępność obiektu:
free access
Prawa:
Wszystkie prawa zastrzeżone (Copyright);
Dla wszystkich w zakresie dozwolonego użytku
Data:
2005.12.31;
2005
Typ:
artykuł
Język:
eng;
angielski;
English
Źródło:
<sygn. PWr A3481II>;
http://aleph.bg.pwr.wroc.pl/F/?func=find-b&request=000122307+&find_code=SYS&adjacent=N&local_base=TUR&x=64&y=13&filter_code_1=WLN&filter_request_1=&filter_code_2=WYR&filter_request_2=&filter_code_3=WYR&filter_request_3=&filter_code_4=WFT&filter_request_4=&filter_code_5=WSB&filter_request_5= ;http://opticaapplicata.pwr.edu.pl
Wydawca:
Oficyna Wydawnicza Politechniki Wrocławskiej
Relacja:
Optica Applicata;
Optica Applicata, Vol. 35, 2005;
Optica Applicata, Vol. 35, 2005, nr 3;
Politechnika Wrocławska. Wydział Podstawowych Problemów Techniki
Temat i słowa kluczowe:
optyka;
Si–SiO2 system;
interferometry;
radius of curvature;
stress
Dostawca danych:
Dolnośląska Biblioteka Cyfrowa

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